High-performance polishing slurries (the component at issue in this infringement matter) are utilized extensively in the semiconductor industry. They are critical in the manufacture of the most advanced integrated-circuit devices, enabling the production of smaller, faster, and more complex electronics with fewer defects. This nanotechnology, by definition, operates on a molecular level, and, as such, cries out for visual explanations to the uninitiated. To that end, a series of animated tutorials was developed, aiming to tell the CMP (chemical-mechanical planarization) story in bite-sized, step-by-step terms.
